Figure 2.3.1.9

Parrish, W.; Langford, J. I.

doi:10.1107/97809553602060000578

International
Tables for
Crystallography
Volume C
Mathematical, physical and chemical tables
Edited by E. Prince

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International Tables for Crystallography (2006). Vol. C. ch. 2.3, p. 49

Figure 2.3.1.9

W. Parrish^a ^‡ and J. I. Langford^b

^a IBM Almaden Research Center, San Jose, CA, USA, and ^bSchool of Physics & Astronomy, University of Birmingham, Birmingham B15 2TT, England

Figure 2.3.1.9

(a) Effect of source size on profile shape, Cu Kα, α_ES 1°, α_RS 0.05°, Si(111). $[\matrix{{\rm No.} &{\rm Projected \, size \,(mm)} &{\rm FWHM} \, (^\circ 2\theta) \cr 1 &1.6 \times 1.0\, ({\rm spot}) &0.31 \cr 2 &0.32 \times 10 \, ({\rm line}) &0.11 \cr 3& 0.16 \times 10 \, ({\rm line}) &0.13 \cr 4 &0.32 \times 12 \,({\rm line}) &0.17 \cr}]$ Effect of receiving-slit aperture α_RS on profiles of quartz (b) (100) and (c) (121); peak intensities normalized, Cu Kα, α_ES 1°.