International
Tables for
Crystallography
Volume C
Mathematical, physical and chemical tables
Edited by E. Prince

International Tables for Crystallography (2006). Vol. C. ch. 9.2, p. 757

Section 9.2.1.7.3. Determination of the identity period

D. Pandeyc and P. Krishnab

9.2.1.7.3. Determination of the identity period

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The number of layers, n, in the hexagonal unit cell can be found by determining the c parameter from the c-axis rotation or oscillation photographs and dividing this by the layer spacing h for that compound which can be found from reflections with hk = 0mod3. The density of reciprocal-lattice points along rows parallel to c* depends on the periodicity along the c axis. The larger the identity period along c, the more closely spaced are the diffraction spots along c*. In situations where there are not many structural extinctions, n can be determined by counting the number of spacings after which the sequence of relative intensities begins to repeat along the 10.l row of spots on an oscillation or Weissenberg photograph (Krishna & Verma, 1963[link]). If the structure contains a random stacking disorder of close-packed layers (stacking faults), this will effectively make the c parameter infinite [({\bf c}^*\rightarrow0)] and lead to the production of characteristic continuous diffuse streaks along reciprocal-lattice rows parallel to c* for reflections with hk [\neq] 0mod3 (Wilson, 1942[link]). It is therefore difficult to distinguish by X-ray diffraction between structures of very large unresolvable periodicities and those with random stacking faults. Lattice resolution in the electron microscope has been used in recent years to identify such structures (Dubey, Singh & Van Tendeloo, 1977[link]). A better resolution of diffraction spots along the 10.l reciprocal-lattice row can be obtained by using the Laue method. Standard charts for rapid identification of SiC polytypes from Laue films are available in the literature (Mitchell, 1953[link]). Identity periods as large as 594 layers have been resolved by this method (Honjo, Miyake & Tomita, 1950[link]). Synchrotron radiation has been used for taking Laue photographs of ZnS polytypes (Steinberger, Bordas & Kalman, 1977[link]).

References

First citation Dubey, M., Singh, G. & Van Tendeloo, G. (1977). X-ray diffraction and transmission electron microscopy study of extremely large-period polytypes in SiC. Acta Cryst. A33, 276–279.Google Scholar
First citation Honjo, G., Miyake, S. & Tomita, T. (1950). Silicon carbide of 594 layers. Acta Cryst. 3, 396–397.Google Scholar
First citation Krishna, P. & Verma, A. R. (1963). Anomalies in silicon carbide polytypes. Proc. R. Soc. London Ser. A, 272, 490–502.Google Scholar
First citation Mitchell, R. S. (1953). Application of the Laue photograph to the study of polytypism and syntaxic coalescence in silicon carbide. Am. Mineral. 38, 60–67.Google Scholar
First citation Steinberger, I. T., Bordas, J. & Kalman, Z. H. (1977). Microscopic structure studies of ZnS crystals using synchrotron radiation. Philos. Mag. 35, 1257–1267.Google Scholar
First citation Wilson, A. J. C. (1942). Imperfection in the structure of cobalt. II. Mathematical treatment of proposed structure. Proc. R. Soc. London Ser A, 180, 277–285.Google Scholar








































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